The NEO 3400 series production platform is one of the latest additions to the industry leading NEO range of advanced plasma ashing and etching products from Trymax Semiconductor Equipment.
It’s ready for the highest volume of production and adaptable to every production ramp and budget. The NEO 3400 platform can be configured with any of the available Trymax NEO process modules and is compatible with substrates up to 300mm in diameter. The small footprint and modular design can be flexibly configured based on your production needs.
This platform can be used as a full bridge tool with compatibility to run both 200 and 300mm diameter substrates.