- EPTC on 5 December 2023
Innovative Solutions
Leading edge plasma-based systems for wafer manufacturing from 3’’ up to 12’’
Discover the NEO series
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From Front End to Back End for Analog, Digital, Power, RF, MEMS, Compound Semiconductor and Wafer Level Packaging
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All upcoming eventsExpert in plasma
Trymax developed a strong expertise in plasma equipment and processes over the last 15 years. With more than 250 NEO systems installed worldwide, Trymax solutions are:
- Delivering high performances
- Recognized as highly reliable
- Demonstrating low Cost of Ownership
- Requiring very limited maintenance
- Compact with reduced footprint
- Capable of managing multiple wafer sizes and substrates materials
- Built with state of the art components, interfaces, and software
Wide range of applications
Trymax has a wide portfolio of plasma technologies to fit the customer and application needs.
- Photoresist bulk ashing
- High dose implant stripping
- Descum
- Non-critical isotropic etching
- Polymer removal post DRIE in cavities or TSV
- Sacrificial layer release
- Various surface treatments
- Photoresist UV curing
- UV charge erase
Want to know more about our applications, technologies and products?
Our team is more than happy to answer any questions and discuss how we can help you. Do not hesitate to contact us today.